JPH0564456B2 - - Google Patents

Info

Publication number
JPH0564456B2
JPH0564456B2 JP58238805A JP23880583A JPH0564456B2 JP H0564456 B2 JPH0564456 B2 JP H0564456B2 JP 58238805 A JP58238805 A JP 58238805A JP 23880583 A JP23880583 A JP 23880583A JP H0564456 B2 JPH0564456 B2 JP H0564456B2
Authority
JP
Japan
Prior art keywords
layer
resistance wiring
polycrystalline silicon
resistance
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58238805A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60130844A (ja
Inventor
Takeo Maeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58238805A priority Critical patent/JPS60130844A/ja
Priority to US06/683,479 priority patent/US4643777A/en
Priority to EP84115903A priority patent/EP0159408A3/en
Publication of JPS60130844A publication Critical patent/JPS60130844A/ja
Publication of JPH0564456B2 publication Critical patent/JPH0564456B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/40—Resistors
    • H10D1/47—Resistors having no potential barriers
    • H10D1/474—Resistors having no potential barriers comprising refractory metals, transition metals, noble metals, metal compounds or metal alloys, e.g. silicides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/035—Diffusion through a layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/105—Masks, metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/147—Silicides

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
JP58238805A 1983-12-20 1983-12-20 半導体装置の製造方法 Granted JPS60130844A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58238805A JPS60130844A (ja) 1983-12-20 1983-12-20 半導体装置の製造方法
US06/683,479 US4643777A (en) 1983-12-20 1984-12-19 Method of manufacturing a semiconductor device comprising resistors of high and low resistances
EP84115903A EP0159408A3 (en) 1983-12-20 1984-12-20 Method of manufacturing a semiconductor device comprising resistors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58238805A JPS60130844A (ja) 1983-12-20 1983-12-20 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS60130844A JPS60130844A (ja) 1985-07-12
JPH0564456B2 true JPH0564456B2 (en]) 1993-09-14

Family

ID=17035549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58238805A Granted JPS60130844A (ja) 1983-12-20 1983-12-20 半導体装置の製造方法

Country Status (3)

Country Link
US (1) US4643777A (en])
EP (1) EP0159408A3 (en])
JP (1) JPS60130844A (en])

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1186485B (it) * 1985-12-20 1987-11-26 Sgs Microelettronica Spa Circuito integrato monolitico,in particolare di tipo mos o cmos e processo per la realizzazione di tale circuito
FR2602093B1 (fr) * 1985-12-27 1988-10-14 Bull Sa Procede de fabrication d'une resistance electrique par dopage d'un materiau semiconducteur et circuit integre en resultant
JPS62177909A (ja) * 1986-01-31 1987-08-04 Hitachi Ltd 半導体装置の製造方法
US4762801A (en) * 1987-02-20 1988-08-09 National Semiconductor Corporation Method of fabricating polycrystalline silicon resistors having desired temperature coefficients
US5240511A (en) * 1987-02-20 1993-08-31 National Semiconductor Corporation Lightly doped polycrystalline silicon resistor having a non-negative temperature coefficient
US4783379A (en) * 1987-04-17 1988-11-08 Tosoh Smd, Inc. Explosive crystallization in metal/silicon multilayer film
GB8710359D0 (en) * 1987-05-01 1987-06-03 Inmos Ltd Semiconductor element
US4822749A (en) * 1987-08-27 1989-04-18 North American Philips Corporation, Signetics Division Self-aligned metallization for semiconductor device and process using selectively deposited tungsten
DE3817882A1 (de) * 1988-05-26 1989-12-07 Siemens Ag Bipolartransistorstruktur mit reduziertem basiswiderstand und verfahren zur herstellung eines basisanschlussbereiches fuer die bipolartransistorstruktur
JPH0821629B2 (ja) * 1988-11-08 1996-03-04 ヤマハ株式会社 集積回路装置の製法
US5066613A (en) * 1989-07-13 1991-11-19 The United States Of America As Represented By The Secretary Of The Navy Process for making semiconductor-on-insulator device interconnects
US5079177A (en) * 1989-09-19 1992-01-07 National Semiconductor Corporation Process for fabricating high performance bicmos circuits
JPH0434966A (ja) * 1990-05-30 1992-02-05 Seiko Instr Inc 半導体装置の製造方法
US5538915A (en) * 1992-06-05 1996-07-23 The Regents Of The University Of California Process for forming synapses in neural networks and resistor therefor
US5266156A (en) * 1992-06-25 1993-11-30 Digital Equipment Corporation Methods of forming a local interconnect and a high resistor polysilicon load by reacting cobalt with polysilicon
US5252502A (en) * 1992-08-03 1993-10-12 Texas Instruments Incorporated Method of making MOS VLSI semiconductor device with metal gate
US5545576A (en) * 1994-04-28 1996-08-13 Casio Computer Co., Ltd. Method for manufacturing a thin film transistor panel
JP3297784B2 (ja) * 1994-09-29 2002-07-02 ソニー株式会社 拡散層抵抗の形成方法
TW297954B (en) * 1996-06-01 1997-02-11 Winbond Electronics Corp Manufacturing method of load resistor of SRAM
US6143613A (en) * 1997-06-30 2000-11-07 Vlsi Technology, Inc. Selective exclusion of silicide formation to make polysilicon resistors
US6143474A (en) 1998-05-07 2000-11-07 Taiwan Semiconductor Manufacturing Company Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates
US6162584A (en) * 1998-05-07 2000-12-19 Taiwan Semiconductor Manufacturing Company Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors and capacitor plates in an integrated circuit
US6211031B1 (en) 1998-10-01 2001-04-03 Taiwan Semiconductor Manufacturing Company Method to produce dual polysilicon resistance in an integrated circuit
US6187617B1 (en) 1999-07-29 2001-02-13 International Business Machines Corporation Semiconductor structure having heterogeneous silicide regions and method for forming same
KR100630706B1 (ko) * 2004-10-21 2006-10-02 삼성전자주식회사 저항체를 구비한 반도체 집적 회로 및 그 제조방법
US7393701B2 (en) * 2006-12-05 2008-07-01 International Business Machines Corporation Method of adjusting buried resistor resistance
US7785979B2 (en) * 2008-07-15 2010-08-31 International Business Machines Corporation Integrated circuits comprising resistors having different sheet resistances and methods of fabricating the same
CN108550583B (zh) * 2018-05-09 2021-03-23 京东方科技集团股份有限公司 一种显示基板、显示装置及显示基板的制作方法

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3345221A (en) * 1963-04-10 1967-10-03 Motorola Inc Method of making a semiconductor device having improved pn junction avalanche characteristics
US3566518A (en) * 1967-10-13 1971-03-02 Gen Electric Method for fabricating field-effect transistor devices and integrated circuit modules containing the same by selective diffusion of activator impurities through preselected portions of passivating-insulating films
GB1355806A (en) * 1970-12-09 1974-06-05 Mullard Ltd Methods of manufacturing a semiconductor device
US3909319A (en) * 1971-02-23 1975-09-30 Shohei Fujiwara Planar structure semiconductor device and method of making the same
US3777364A (en) * 1972-07-31 1973-12-11 Fairchild Camera Instr Co Methods for forming metal/metal silicide semiconductor device interconnect system
US4290187A (en) * 1973-10-12 1981-09-22 Siemens Aktiengesellschaft Method of making charge-coupled arrangement in the two-phase technique
US3918149A (en) * 1974-06-28 1975-11-11 Intel Corp Al/Si metallization process
US4025364A (en) * 1975-08-11 1977-05-24 Fairchild Camera And Instrument Corporation Process for simultaneously fabricating epitaxial resistors, base resistors, and vertical transistor bases
NL7510903A (nl) * 1975-09-17 1977-03-21 Philips Nv Werkwijze voor het vervaardigen van een halfgelei- derinrichting, en inrichting vervaardigd volgens de werkwijze.
US3976512A (en) * 1975-09-22 1976-08-24 Signetics Corporation Method for reducing the defect density of an integrated circuit utilizing ion implantation
JPS537276A (en) * 1976-07-08 1978-01-23 Kato Giichirou Ddc bias type field strength measuring instrument
DE2631873C2 (de) * 1976-07-15 1986-07-31 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung eines Halbleiterbauelements mit einem Schottky-Kontakt auf einem zu einem anderen Bereich justierten Gatebereich und mit kleinem Serienwiderstand
JPS6057227B2 (ja) * 1976-11-11 1985-12-13 日本電気株式会社 半導体装置の製造方法
GB1596184A (en) * 1976-11-27 1981-08-19 Fujitsu Ltd Method of manufacturing semiconductor devices
JPS5367361A (en) * 1976-11-27 1978-06-15 Fujitsu Ltd Semiconductor device
US4080718A (en) * 1976-12-14 1978-03-28 Smc Standard Microsystems Corporation Method of modifying electrical characteristics of MOS devices using ion implantation
US4141022A (en) * 1977-09-12 1979-02-20 Signetics Corporation Refractory metal contacts for IGFETS
US4224733A (en) * 1977-10-11 1980-09-30 Fujitsu Limited Ion implantation method
NL190710C (nl) * 1978-02-10 1994-07-01 Nec Corp Geintegreerde halfgeleiderketen.
US4297721A (en) * 1978-11-03 1981-10-27 Mostek Corporation Extremely low current load device for integrated circuit
JPS5950214B2 (ja) * 1979-05-16 1984-12-07 松下電器産業株式会社 半導体装置の製造方法
DE3016050C2 (de) * 1980-04-25 1985-08-29 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Fotolackstrukturen für integrierte Halbleiterschaltungsanordnungen
US4285761A (en) * 1980-06-30 1981-08-25 International Business Machines Corporation Process for selectively forming refractory metal silicide layers on semiconductor devices
US4362597A (en) * 1981-01-19 1982-12-07 Bell Telephone Laboratories, Incorporated Method of fabricating high-conductivity silicide-on-polysilicon structures for MOS devices
DE3204054A1 (de) * 1981-02-23 1982-09-09 Intel Corp., Santa Clara, Calif. Widerstand in integrierter schaltungstechnik und verfahren zu dessen herstellung
US4446613A (en) * 1981-10-19 1984-05-08 Intel Corporation Integrated circuit resistor and method of fabrication
JPS582068A (ja) * 1981-06-26 1983-01-07 Toshiba Corp 半導体装置およびその製造方法
FR2515427A1 (fr) * 1981-10-27 1983-04-29 Efcis Procede de fabrication de resistances de forte valeur pour circuits integres

Also Published As

Publication number Publication date
EP0159408A2 (en) 1985-10-30
EP0159408A3 (en) 1987-02-04
US4643777A (en) 1987-02-17
JPS60130844A (ja) 1985-07-12

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